Application: | Aviation, Industrial, Medical |
---|---|
Standard: | GB, ASTM |
Purity: | W50-90, Cu10-50 |
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Material | WCu% Tungsten Content |
Hardness HB |
g/ Density at 20ºC |
W/M.K Thermal conductivity at 25ºC |
(10-6/k) Coefficient of thermal expansion at 20ºC |
W90Cu10 | 90 | 260 | 17.0 | 180-190 | 6.5 |
W85Cu15 | 85 | 240 | 16.4 | 190-200 | 7.0 |
W80Cu20 | 80 | 220 | 15.6 | 200-210 | 8.3 |
W75Cu25 | 75 | 195 | 14.9 | 220-230 | 9.0 |
W50Cu50 | 50 | 125 | 12.2 | 310-340 | 12.5 |
Class |
Density g/cm3 |
Hardness MN/m2 |
Resistivity μΩ.cm |
Conductivity IACS |
|||||||||
W50Cu50 |
11.85 |
1128 |
3.2 |
54 |
|||||||||
W55Cu45 |
12.30 |
1226 |
3.5 |
49 |
|||||||||
W60Cu40 |
12.75 |
1373 |
3.7 |
47 |
|||||||||
W65Cu35 |
13.3 |
1520 |
3.9 |
44 |
|||||||||
W70Cu30 |
13.8 |
1716 |
4.1 |
42 |
|||||||||
W75Cu25 |
14.5 |
1912 |
4.5 |
38 |
|||||||||
W80Cu20 |
15.15 |
2158 |
5.0 |
34 |
|||||||||
W85Cu15 |
15.9 |
2354 |
5.7 |
30 |
|||||||||
W90Cu10 |
16.75 |
2550 |
6.5 |
27 |
|||||||||
Code No. | Chemical Composition % | Mechanical properties | |||||||||||
CU | Impurity | W | Density (g/cm3 ) |
Hardness HB |
RES (cm) |
Conductivity IACS/ % |
TRS/ Mpa |
||||||
CuW50 | 50+/-2.0 | 0.5 | Balance | 11.85 | 115 | 3.2 | 54 | / | |||||
CuW55 | 45+/-2.0 | 0.5 | Balance | 12.3 | 125 | 3.5 | 49 | / | |||||
CuW60 | 40+/-2.0 | 0.5 | Balance | 12.75 | 140 | 3.7 | 47 | / | |||||
CuW65 | 35+/-2.0 | 0.5 | Balance | 13.3 | 155 | 3.9 | 44 | / | |||||
CuW70 | 30+/-2.0 | 0.5 | Balance | 13.8 | 175 | 4.1 | 42 | 790 | |||||
CuW75 | 25+/-2.0 | 0.5 | Balance | 14.5 | 195 | 4.5 | 38 | 885 | |||||
CuW80 | 20+/-2.0 | 0.5 | Balance | 15.15 | 220 | 5 | 34 | 980 | |||||
CuW85 | 15+/-2.0 | 0.5 | Balance | 15.9 | 240 | 5.7 | 30 | 1080 | |||||
CuW90 | 10+/-2.0 | 0.5 | Balance | 16.75 | 260 | 6.5 | 27 | 1160 |
W Rods Purity | 99.95 |
Density | >19.2g/cm3 |
Flatness | <2% |
Dimension | Diameter(2.0-100)*L (mm) |
Surface | Black,ground&polished |
Price | As order quantity and surface |
Delivery time | 7-15 days |
Application | Used in electric boosting glass kiln electrode Suitable for producing ion implantation parts; For producing electric light source parts and electric vacuum components; For producing heating elements and refractory parts in high temperature furnaces; Used as electrodes in the field of rare earth metal industry. |
Content of Tungsten | Content of all other elements | Content of each element |
≥99.95% | ≤0.05% | ≤0.01% |